엘엠에스 주식회사
Smart Choice For The Future




Laser Cleaning Solution
Dry Laser Cleaning Solution for Semi-Conductor
Benefits
Advantages
Why our dry laser cleaning solution is better?
Current cleaning methods, like ultrasonic baths and repeated validations, do not always remove all residues, which lead to QA inspection rejections.
Also, these manual processes increase the risk of wafer breakage and result in efficiency losses.
- Dust particles
- Isopropanol residue
- Organic removal